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OCTOPUS II - PECVD/PVD system can cover a broad range of deposition job constellations, up to 6 deposition modules
The OCTOPUS combines reactor and system design developments such as the IRFE technology for exceptional stable plasma conditions, the Mirror reactor concept for top and bottom deposition or the potential combination of the PECVD and PVD deposition mode in one system without any interruption of the process sequence, provide an extraordinary high flexibility for many thin film applications.
1. The Mirror reactor system (Mirror TOP for topside deposition / Mirror BOTTOM for bottom-side deposition) can deposit two sides without flipping of substrates and without vacuum-breaking.
Continuous and high-throughput deposition under vacuum.
INDEOtec is a Swiss privately held company driven by innovation and technology in thin film deposition equipment sectors. Company is located in the Neuchatel-Jura region of Switzerland, center of excellence for Micro-technologies & Nano-technologies. Our staff comprised of a technology and engineering team is continually committed to improving existing products and developing new solutions to allow customers and partners maximum flexibility, modularity and reliability to achieve their goals.