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The scia Batch 350 is designed for homogeneous coating of several 3‑dimensional shaped substrates in one batch. Typical applications are biocompatible films for medical objects.
The scia Batch 350 uses a RF parallel plate arrangement with rotation of each substrate for a homogeneous coating of all sides. The system is also available with an additional DC bias applied to the substrate holder.
|Carrier size||2 carriers with maximum size of 350 mm x 240 mm|
|Substrate holder||Water cooled, pulsed DC bias|
|Plasma source||RF parallel plate arrangement, 13.56 MHz|
|Max. RF power||2 x 600 W|
|Electrode setup||Temperature: Heating up to 400°C|
|Distance: Adjustable between 50 mm and 150 mm|
|Operation modes||Independent or coupled electrodes|
|Typical deposition rate||SiC: 5 nm/min|
|Base Pressure||< 5 x 10-7 mbar|
|System dimensions (W x D x H)||0.90 m x 1.70 m x 2.30 m (without electrical rack and pumps)|
|Tool configuration||1 process chamber with manual loading|
|Software interface||SECS II / GEM|