The MULAS Cu bathes are dedicated to semiconductor applications for wafer plating in order to produce copper pillars, micro copper pillars and RDL.
Mitsubishi Materials Corp. Electronics proposes a low-alpha product range particularly adapted to the semiconductor industry.
The flexibility and the reliability of their bathes offer a huge process window with the possibility to use current densities from 10 ASD to 25 ASD (up to 5.5µm/min).