Document Basket

Saved pages

Saved documents

Please note: This information is saved in a cookie. In case your browser deletes cookies after a session, the information will be lost.

Need support?

Invalid Captcha
Thank you for downloading our white paper. You will receive an email soon with a link to the pdf.

INDEOtec Octopus

OCTOPUS II - PECVD/PVD system can cover a broad range of deposition job constellations, up to 6 deposition modules

Product description

The OCTOPUS combines reactor and system design developments such as the IRFE technology for exceptional stable plasma conditions, the Mirror reactor concept for top and bottom deposition or the potential combination of the PECVD and PVD deposition mode in one system without any interruption of the process sequence, provide an extraordinary high flexibility for many thin film applications.

Special Features

1. The Mirror reactor system (Mirror TOP for topside deposition / Mirror BOTTOM  for bottom-side deposition) can deposit two sides without flipping of substrates and without vacuum-breaking.

Technical Specification

Continuous and high-throughput deposition under vacuum.

Contact Us

Room Unit 605-607, Build 2, Xinglian Building,
No.1535 Hongmei Road, Xuhui District, Shanghai
TEL: 021-5383 8811

FAX: 021-3367 8466
  • Semiconductor, Solar & Electronics
INDEOtecINDEOtec is a Swiss privately held company driven by innovation and technology in thin film deposition equipment sectors. Company is located in the Neuchatel-Jura region of Switzerland, center of excellence for Micro-technologies & Nano-technologies. Our staff comprised of a technology and engineering team is continually committed to improving existing products and developing new solutions to allow customers and partners maximum flexibility, modularity and reliability to achieve their goals.
[Indeotec, Octopus]