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The OCTOPUS combines reactor and system design developments such as the IRFE technology for exceptional stable plasma conditions, the Mirror reactor concept for top and bottom deposition or the potential combination of the PECVD and PVD deposition mode in one system without any interruption of the process sequence, provide an extraordinary high flexibility for many thin film applications.
1. The Mirror reactor system (Mirror TOP for topside deposition / Mirror BOTTOM for bottom-side deposition) can deposit two sides without flipping of substrates and without vacuum-breaking.
Room Unit 605-607, Build 2, Xinglian Building,
No.1535 Hongmei Road, Xuhui District, Shanghai
|TEL: 021-5383 8811
FAX: 021-3367 8466